The article presents the results of studies of electrochemical deposition of silver nanoparticles (AgNPs) on the silicon surface in dimethylformamide solutions of 0.025M; 0.05M; 0.1M (NH4)[Ag(CN)2]. Combination of a pulsed electrolysis mode and an organic aprotic solvent medium (DMF) ensures the formation of 50-150 nm spherical AgNPs with uniform distribution over the silicon surface. It is shown that the main factors influencing the morphology and size of silver nanoparticles are the value of the cathode potential, the concentration of ions [Ag(CN)2]- and the duration of electrolysis. With their increase, the size of the nanoparticles and the density of filling the substrate increases. It was found that the deposited AgNPs on the surface of the substrate are activators of chemical etching of the latter to give porous silicon.
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