optical photolithography

The paper presents a method of phased optical lithography using as source, light-emitting diodes (LED) with wavelengths of 410 nm and 365 nm to form inhomogeneous dielectric waveguides.  Distribution of surface plasmon polaritons, at the beginning of the excitation of the waveguide with 632.8 nm laser was studied.  Fourier image confirming occurrence of surface plasmon polaritons was obtained.