Research of volt-ampere characteristics of the wire Pierce electron gun under electron-beam microprocessing of dielectrics

2018;
: 58-64
https://doi.org/10.23939/ujmems2018.01.058
Received: February 19, 2018
Revised: May 29, 2018
Accepted: June 26, 2018

M. Bondarenko, et al., "Research of volt-ampere characteristics of the wire Pierce electron gun under electron-beam microprocessing of dielectrics", Ukrainian Journal of Mechanical Engineering and Materials Science, vol. 4, no. 1, pp. 58-64, 2018.

1
Cherkasy State Technological University
2
National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”
3
Cherkasy State Technological University
4
Cherkasy State Technological University
5
Cherkasy State Technological University

The article considers the basic energy characteristics of a wire Pierce electron-beam gun, which used for microprocessing of dielectric materials in vacuo. The aim of the work is to determine the optimal regimes of electron-beam microprocessing of dielectric materials by studying the volt-ampere characteristics of the wire Pierce electron-beam gun. In the methodical part of the scientific work, a technological experiment with electron-beam microprocessing of dielectric surfaces is proposed, and also identified and studied the operating modes of the Pierce electron-beam gun in depending on their energy characteristics. As a result, the analysis of the obtained results of electron-beam microprocessing of surfaces of dielectric materials makes it possible to increase the reproducibility of the results of such treatment in terms of purity and residual nanorelief by 18 ... 25%. The comparison of the results of experimental electron-beam microprocessing of dielectrics with the results of their laser processing made it possible to establish a decrease in the residual microroughness of the surface of the optical glass K8 by 17 ... 27 times with electron-beam microprocessing and by 12 ... 14 times with surface laser treatment. Wherein, surface laser processing does not allow to eliminate the undulation of the surface, which is related to the specificity of the interaction of the laser beam with the surface of the optical material, whereas, when processing by the ribbon-shaped electronic stream such undulation does not appear. Conclusions and analyzed data obtained in the article based on the results of experimental studies can be used to optimize the technological regimes of electron-beam microprocessing in the production of micro-optics products, integrated optics, microelectrooptics, nanoelectronics, etc.

[1] H. V. Kanashevych, et al., “Optoelektronika i mikrooptyka – perspektyvni haluzi nauky i tekhniky” [“Optoelectronics and microoptics are promising branches of science and technology”], Visnyk Cherkaskoho derzhavnoho tekhnolohichnoho universytetu [Collected scientific works of Cherkasy State Technological University], vol. 2, pp. 52–62, 2002. [in Ukrainian].
[2] M. O. Bondarenko, et al., “Vyvchennia umov utvorennia nanostruktur na poverkhniakh p‘iezoelektrychnykh keramik pid diieiu strichkovoho elektronnoho potoku” [“Study of the conditions for the formation of nanostructures on the surfaces of piezoelectric ceramics under the action of a tape electron flux”], Visnyk Skhidnoukrainskoho natsionalnoho universitetu im.V.Dalia [Collected scientific works of V. Dalia East-Ukrainian National University], vol. 8 (162), part 2, pp. 30–34, 2011. [in Ukrainian].
[3] Yu. I. Kovalenko, et al., “Doslidzhennia ta formuvannia strichkovoho elektronnoho potoku dlia mikroobrobky poverkhon materialiv” [“Research and formation of tape electronic flow for microprocessing of materials surfaces”], Novi materialy i tekhnolohii v metalurhii ta mashynobuduvanni [ New materials and technology in metal and machinery], vol. 2, pp. 58–63, 2012. [in Ukrainian].
[4] Yu. I. Kovalenko, et al., “Modyfikatsiia nanoreliefu na optychnomu skli elektronno-promenevoiu mikroobrobkoiu” [“Modification of the nanorelief on optical glass by electron beam microprocessing”], Visnyk Cherkaskoho derzhavnoho tekhnolohichnoho universytetu [Collected scientific works of Cherkasy State Technological University], vol. 1, pp. 104–107, 2012. [in Ukrainian].
[5] E. Micler, Ching-Te Li, A. T. Krishnan, Changming Jin and Manoj Jain, “A charge damage study using an electron beam low k treatment”, in Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729), Burlingame, CA, USA, 2004, pp. 190–192.
[6] N. V. Nikonorov, et al., “Electron-beam modification of the near-surface layers of photosensitive glasses”, Tech. Phys. Lett., vol. 35, pp. 309–311, 2009. https://doi.org/10.1134/S1063785009040063
[7] O. S. Druj, et al., “Electron beam transport in dielectric tubes”, East Eur. J. Phys., vol. 1, pp. 70–73, 2014.
[8] M. P. Rud, et al., “The express-diagnostics of band electronic stream”, Visnyk Cherkaskoho derzhavnoho tekhnolohichnoho universytetu [Collected scientific works of Cherkasy State Technological University], vol. 3, pp. 49–51, 2005.
[9] M. P. Rud, et al., “Vyznachennia rozpodilu hustyny strumu strichkovoho elektronnoho potoku pry obrobtsi optychnykh materialiv” [“Determination of the distribution of the current density of the tape electron beam in the processing of optical materials”], in Proc. V International scientific-practical conference “Dynamics of scientific research – 2006”, Dnipropetrovsk, Ukraine, 2006, vol. 7, pp. 45–47. [in Ukrainian].
[10] M. O. Bondarenko, H. V. Kanashevych and V. A. Vashchenko, “Optymizatsiia parametriv strichkovoho elektronnoho potoku za dopomohoiu zon termichnoho vplyvu” [“Optimization of the parameters of the tape electronic stream with the help of zones of thermal influence”], in Proc. I Int. Science and Technical Conference “Mechanical engineering and metal working – 2003”, Kirovohrad, Ukraine, 2003, pp. 15–16. [in Ukrainian].