The parameters of GaAs epitaxial layers grown by the low-temperature LPE method in the temperature range of 600–500 °C under varying cooling rates and different degrees of supercooling (5 °C, 10 °C, and 15 °C) of the gallium solution-melt were calculated. To achieve maximum cooling rates, a method involving the introduction of a cold body above the graphite cassette was used to cool the substrate–melt interface, enabling a change in the cooling rate from 5 °C/min to 14 °C/min within 230 seconds. It was found that under these conditions, it is possible to crystallize layers with maximum thicknesses of 7.5 μm, 10 μm, and 12 μm, respectively. The obtained theoretical results show good agreement with experimental data. The crystallized GaAs epitaxial layers can be used in the fabrication of various terahertz-range devices.
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