: pp.19-25
Lviv Polytechnic National University
Lviv Polytechnic National University
Lviv Polytechnic National University
Lviv Polytechnic National University
Lviv Polytechnic National University
Ivan Franko National University of Lviv
Ivan Franko National University of Lviv
Ivan Franko National University of Lviv

The results of a complex study of the semiconductor thermometric material TiСo1-xMnxSb, х=0.01–0.10, for the producing of sensitive elements of thermoelectric and electro resistive sensors are presented. Microprobe analysis of the concentration of atoms on the surface of TiСo1-xMnxSb samples established their correspondence to the initial compositions of the charge, and X-ray phase analysis showed the absence of traces of extraneous phases on their diffractograms. The produced structural studies of the thermometric material TiСo1-xMnxSb allow to speak about the ordering of its crystal structure, and the substitution of Co atoms on Mn at the 4c position generate structural defects of acceptor nature. The obtained results testify to the homogeneity of the samples and their suitability for the study of electrokinetic performances and the manufacture of sensitive elements of thermocouples. 

Modeling of structural, electrokinetic and energetic performances of TiСo1-xMnxSb, х=0.01–0.10, for different variants of spatial arrangement of atoms is performed. To model energetic and kinetic performances, particularly the behavior of the Fermi level, the band gap, the density of states (DOS) distribution was calculated for an ordered variant of the structure in which Co atoms at position 4c are replaced by Mn atoms. Substitution of Co atoms (3d74s2) by Mn (3d54s2) generates structural defects of acceptor nature in the TiСo1-xMnxSb semiconductor (the Mn atom contains fewer 3d- electrons than Co). This, at the lowest concentrations of impurity atoms Mn, leads to the movement of the Fermi level   from the conduction band  to the depth of the band gap. In a semiconductor with the composition TiCo0.99Mn0.01Sb, the Fermi level  is located in the middle of the band gap, indicating its maximum compensation when the concentrations of ionized acceptors and donors are close. At higher concentrations of impurity Mn atoms, the number of generated acceptors will exceed the concentration of donors, and the concentration of free holes will exceed the concentration of electrons. Under these conditions, the Fermi level  approach, and then the level of the valence band  TiСo1-xMnxSb cross: the dielectric-metal conductivity transition take place.

The presence of a high-temperature activation region on the temperature dependence of the resistivity ln(ρ(1/T)) TiСo1‑xMnxSb at the lowest concentration of impurity atoms Mn, х=001, indicates the location of the Fermi level  in the band gap  of the semiconductor thermopower coefficient α(Т,х) at these temperatures specify its position - at a distance of ~ 6 meV from the level of the conduction band . In this case, electrons are the main carriers of current. The absence of a low-temperature activation region on this dependence indicates the absence of the jumping mechanism  conductivity. Negative values of the thermopower coefficient α(Т,х) TiСo0,99Mn0,01Sb at all temperatures, when according to DOS calculations the concentrations of acceptors and donors are close, and the semiconductor is maximally compensated, can be explained by the higher concentration of uncontrolled donors. However, even at higher concentrations of impurity Mn atoms in TiСo0,98Mn0,02Sb, the sign of the thermopower coefficient α(Т,х) remains negative, but the value of resistivity ρ(х,Т) increases rapidly, and the Fermi level  deepens into the forbidden zone at a distance of ~ 30 meV. The rapid increase in the values of the resistivity ρ(х,Т) in the region of concentrations х=0.01–0.02 shows that acceptors are generated in the TiСo1-xMnxSb semiconductor when Co atoms are replaced by Mn, which capture free electrons, reducing their concentration. However, negative values of the thermopower coefficient α(Т,х) are evidence that either the semiconductor has a significant concentration of donors, which is greater than the number of introduced acceptors (х=0.02), or the crystal simultaneously generates defects of acceptor and donor nature. The obtained result does not agree with the calculations of the electronic structure of the TiСo1-xMnxSb semiconductor. It is concluded that more complex structural changes occur in the semiconductor than the linear substitution of Co atoms by Mn, which simultaneously generate structural defects of acceptor and donor nature by different mechanisms, but the concentration of donors exceeds the concentration of generated acceptors.

Based on a comprehensive study of the electronic structure, kinetic and energetic performances of the thermosensitive material TiСo1-xMnxSb, it is shown that the introduction of impurity Mn atoms into TiCoSb can simultaneously generate in the semiconductor an acceptor zone  (substitution of Co atoms for Mn) and donor zones   and of different nature. The ratio of the concentrations of ionized acceptors and donors generated in TiСo1-xMnxSb will determine the position of the Fermi level and the mechanisms of electrical conductivity. However, this issue requires additional research, in particular structural and modeling of the electronic structure of a semiconductor solid solution under different conditions of entry into the structure of impurity Mn atoms. The investigated solid solution TiСo1-xMnxSb is a promising thermometric material.



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